Touch control display device and manufacturing method thereof

ABSTRACT

A manufacturing method of a touch control display device is disclosed. The method includes forming a thin film transistor element layer; forming and patterning a common electrode layer on the thin film transistor element layer to form common electrodes, forming a third insulation layer on the common electrode and the thin film transistor element layer, forming and patterning a conversion layer on the third insulation layer to form conversion lines, and forming on a first via hole that exposes at least a portion of a gate line, and forming a second via hole that exposes at least a portion of the common electrode. Further, first conversion lines are electrically connected to the gate lines via the first via hole, and second conversion lines are electrically connected to the common electrode via the second via hole.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a divisional application of U.S. application Ser.No. 15/006,139, which is based upon and claims priority to ChinesePatent Application 201510102656.9, filed on Mar. 9, 2015, the entirecontents of which are incorporated herein by reference.

TECHNICAL FIELD

The present disclosure generally relates to a field of touch control,and more particularly, to a touch control display device and amanufacturing method thereof.

BACKGROUND

In the related art, a liquid crystal display generally includes adisplay panel having a plurality of data lines, a plurality of gatelines (or referred to as scan lines) intersecting the plurality of datalines, and pixel devices arranged in a matrix form. Further, a thin filmtransistor (TFT) is provided at an intersection of one data line and onegate line. In an embodiment, a gate electrode of the TFT is electricallyconnected to the gate line, a source electrode of the TFT iselectrically connected to the data line, and a drain electrode of theTFT is electrically connected to a pixel electrode. In addition, thedisplay panel may be further provided with a gate driver sequentiallysupplying gate driving signal to the gate lines and a source driversupplying data voltage signal to the data lines. An active area of atypical liquid crystal display is generally in a rectangular shape, andthe gate driving signal and a source driving signal (i.e., the datavoltage signal) are driven using different drivers or an integraldriving chip. However, a gate shift register receiving signals from thedriving chip is generally located in a non-active area at both sides ofthe active area of the display panel, and transmits gate scan signalsvia the scan lines in the active area of the gate shift register,respectively.

A touch display screen, as an input media, is a simple and convenientmeans of human-machine interaction. Accordingly, more and more productshave a touch display function integrated in the liquid crystal display.However, wires for providing touch control signals of touch controlelectrodes have to pass through the non-active area at both sides of thedisplay panel, which further increases the bezel area of the displaypanel.

SUMMARY

Embodiments of the present disclosure provides a manufacturing method ofa touch control display device. The method includes providing a basesubstrate, forming, on the base substrate, a thin film transistorelement layer including a gate metal layer and a source/drain electrodemetal layer. The gate metal layer includes a gate electrode and gatelines, and the source/drain electrode metal layer includes a sourceelectrode, a drain electrode and source lines. The method furtherincludes forming a common electrode layer on the thin film transistorelement layer, and patterning the common electrode layer to form aplurality of common electrodes that are independent from one another,forming a third insulation layer on the common electrode and the thinfilm transistor element layer, forming a conversion layer on the thirdinsulation layer, and patterning the conversion layer to form aplurality of conversion lines including a first conversion lines andsecond conversion lines, and forming on the gate line a first via holethat exposes at least a portion of the gate line, and forming on thecommon electrode a second via hole that exposes at least a portion ofthe common electrode. Further, the first conversion lines areelectrically connected to the gate lines via the first via hole, andsecond conversion lines are electrically connected to the plurality ofcommon electrodes via the second via hole.

Embodiments of the present disclosure further provides a manufacturingmethod of a touch control display device. The method including providinga base substrate, forming, on the base substrate, a thin film transistorelement layer including a gate metal layer and a source/drain electrodemetal layer. The gate metal layer includes a gate electrode and gatelines, and the source/drain electrode metal layer includes a sourceelectrode, a drain electrode and source lines, patterning the thin filmtransistor element layer to form on the gate line a first via hole thatexposes at least a portion of the gate line, forming a pixel electrodelayer and a conversion layer on the thin film transistor element layer,patterning the conversion layer and the pixel electrode layer to form apixel electrode, first conversion lines and second conversion lines. Thefirst conversion lines are electrically connected to gate lines via thefirst via hole, forming a third insulation layer on the first conversionline, the second conversion line and the pixel electrode, patterning thethird insulation layer to form on the second conversion line a secondvia hole that exposes at least a portion of the second conversion line,and forming a common electrode layer on the third insulation layer andpatterning the common electrode layer to form common electrodes that areindependent from one another. The common electrode is electricallyconnected to the second conversion line via the second via hole.

BRIEF DESCRIPTION OF THE DRAWINGS

The drawings used for describing the embodiments are briefly describedhereinafter for a more clear understanding of the technical solution ofthe embodiment of the present disclosure. The drawings in the followingdescription are merely some embodiments of the present disclosure.

FIG. 1 is a plan view of a touch control display device provided in anembodiment of the present disclosure;

FIG. 2 is a partial enlarged view of area A in FIG. 1;

FIG. 3 is a sectional view of a touch control display device provided inan embodiment of the present disclosure;

FIG. 4 is a sectional view of another touch control display deviceprovided in an embodiment of the present disclosure;

FIG. 5 is a sectional view of another touch control display deviceprovided in an embodiment of the present disclosure;

FIG. 6 is a sectional view of another touch control display deviceprovided in an embodiment of the present disclosure;

FIGS. 7A to 7I illustrate a manufacturing method of a touch controldisplay device provided in an embodiment of the present disclosure;

FIGS. 8A and 8B illustrate a manufacturing method of another touchcontrol display device provided in an embodiment of the presentdisclosure; and

FIGS. 9A to 9J illustrate a manufacturing method of another touchcontrol display device provided in an embodiment of the presentdisclosure.

DETAILED DESCRIPTION

FIG. 1 is a plan view of a touch control display device provided in anembodiment of the present disclosure. The touch control display deviceincludes a display area 101 (an area within the dashed block of FIG. 1)and a non-display area (an area outside the dashed block of FIG. 1).There are included in the display area 101 a gate metal layer, asource/drain electrode metal layer, a conversion layer and a commonelectrode layer (not illustrated in the drawing).

The gate metal layer includes a gate electrode (not illustrated in thedrawing) and a plurality of gate lines 103; the source/drain electrodemetal layer includes a source (not illustrated in the drawing), a drain(not illustrated in the drawing) and a plurality of source lines (notillustrated in the drawing); the conversion layer includes a pluralityof conversion lines (107, 109); and the common electrode layer includesa plurality of common electrodes 105 that are independent from oneanother. A first via hole 1031 exposing at least a part of the gate line103 is provided on the gate line 103. A second via hole 1052 exposing atleast a part of the common electrode 105 is provided on the commonelectrode 105. The plurality of gate lines 103 intersect the pluralityof source lines, and the plurality of conversion lines have an extensiondirection substantially parallel to that of the plurality of sourcelines. In one embodiment, the plurality of conversion lines include aplurality of first conversion lines 107 electrically connected with theplurality agate lines 103 via the first via hole 1031 and a plurality ofsecond conversion lines 109 electrically connected with the plurality ofthe common electrodes 105 via the second via hole 1052.

It should be noted that in the embodiment illustrated in FIG. 1, thedisplay area 101 is described with reference to an example having 9common electrodes 105, 6 gate lines 103, 8 first conversion lines 107and 9 second conversion lines 109 only. However, in an actual product,it may be designed freely according to the requirements of the productwithout being limited to the above case.

The non-display area in FIG. 1 further includes a shift register device111 supplying gate driving signal to the plurality of gate lines 103 viathe plurality of first conversion lines 107 and a display touch controldriving device 113. The display touch control driving device 113supplies touch control driving signal to the plurality of commonelectrodes 105 via the plurality of second conversion lines 109 and/orsenses touch control detection signal on the common electrodes 105 viathe plurality of second conversion lines 109. This is because the commonelectrodes 105 may be multiplexed as the touch control drivingelectrodes as well as the touch control detecting electrode in the touchcontrol display device illustrated in FIG. 1.

It should be noted that in the touch control display device illustratedin FIG. 1, the shift register device 111 and the display touch controldriving device 113 are located under the display area 101. However, sucha design is not intended to be limiting. The shift register device 111and the display touch control driving device 113 may be both providedabove the display area 101. The shift register device 111 and thedisplay touch control driving device 113 may be located at the same sideof the display area 101, or may be separately located at opposite sidesof the display area 101. For example, in a case where the shift registerdevice 111 is located at an upper side of the display area 101 and thedisplay touch control driving device 113 is located at a lower side ofthe display area 101, the shift register device 111 still supplies gatedriving signal to the plurality of gate lines 103 via the firstconversion lines 107, and the display touch control driving device 113still supplies touch control driving signal to the plurality of commonelectrodes 105 via the second conversion lines 109 and/or senses touchcontrol detection signal on the common electrodes 105 via the pluralityof second conversion lines 109. In addition, the display touch controldriving device 113 provides control signal to the shift register device111 via a plurality of control lines. In this case, the plurality ofcontrol lines (not illustrated in the drawing) electrically connectingthe shift register device 111 and the display touch control drivingdevice 113 are located at the left side and/or the right side of thedisplay area 101. In one embodiment, the shift register device 111 andthe display touch control driving device 113 are located in the sameside or opposite sides of the display area 101. Such a design maymaximize the narrowing of the bezel.

FIG. 2 is a partial enlarged view of area A in FIG. 1, in which an areaoccupied by arbitrary four common electrodes 105A, 105B, 105C and 105Dis taken as an example. With reference to FIG. 1, the touch controldisplay device includes a base substrate 11 and a plurality of sourcelines 104 intersecting the gate lines 103A, 103B, 103C and 103D. Itshould be noted that only four gate lines are exemplarily illustrated inFIG. 2, but it is not limited thereto. Likewise, only four source lines104 are illustrated in FIG. 2, but it is not limited thereto. A subpixel (not illustrated in FIG. 2) is defined at an intersection of onegate line 103 and one source line 104, and the plurality of conversionlines (the first conversion line 107 and the second conversion line 109)have an extension direction parallel to that of the plurality of sourcelines 104. It should be noted that although the source lines 104 and theplurality of conversion lines (the first conversion line 107 and thesecond conversion line 109) are parallel in a plane in FIG. 2, there isno overlapped area between their projection shadows on the basesubstrate 11 in the vertical direction. However, the present disclosureis not limited to the technical solution illustrated in FIG. 2. Incertain embodiments, the plurality of conversion lines (the firstconversion line 107 and the second conversion line 109) may haveprojection shadows on the base substrate 11 in the vertical direction atleast partly overlap those of the plurality of source lines 104, or theplurality of conversion lines (the first conversion line 107 and thesecond conversion line 109) may have projection shadows on the basesubstrate 11 in the vertical direction at least partly overlap that of ablack matrix (not illustrated in the drawing). Such a design may furtherincrease the aperture ratio.

It should be noted that, in the partial enlarged view illustrated inFIG. 2, any first conversion line is electrically connected to only onegate line. For example, the first conversion line 107 may not beelectrically connected to other gate lines 103A, 103B and 103D whilebeing electrically connected to the gate line 103C. On the contrary, anygate line is electrically connected to at least one of the firstconversion lines. For example, gate line 1030 may be simultaneouslyelectrically connected to three first conversion lines 107 via the firstvia hole 1031, respectively (in this embodiment, three first conversionlines 107 are taken as an example, however, it is not limited to three,but may be arbitrarily designed according to the requirements of theproduct without limitation). Such a design may increase singletransmission stability by transmitting gate scan signal to a same gateline simultaneously with a plurality of first conversion lines.

It should be noted that, in the partial enlarged view illustrated inFIG. 2, any second conversion line is electrically connected to only onecommon electrode. For example, the second conversion line 109 may not beelectrically connected to other common electrodes 105B, 105C and 105Dwhile being electrically connected to the common electrode 105A. On thecontrary, any common electrode is electrically connected to at least oneof the second conversion lines. For example, common electrode 105A maybe simultaneously electrically connected to three second conversionlines 109 via the second via hole 1052, respectively. In thisembodiment, three second conversion lines 109 are illustrated by way ofexample. It will be appreciated that the number of second conversionlines 109 is not limited to three, but may be arbitrarily designedaccording to the requirements of the product without limitation. Such adesign may increase single transmission stability and detectionstability by transmitting touch control driving signal to a same commonelectrode, or sensing touch control detection signal on the same commonelectrode, simultaneously with a plurality of second conversion lines.

It should be noted that, in the partial enlarged view illustrated inFIG. 2, a plurality of redundant lines are included. The plurality ofredundant lines are substantially parallel to the plurality ofconversion lines, and any redundant line is electrically connected toonly one common electrode. For example, as illustrated in FIG. 2, threeredundant lines 108 are provided substantially parallel to the firstconversion lines 107 and the second conversion lines 109. It should benoted that one redundant line 108 may not be electrically connected toother common electrodes 105A, 105B and 105C while being electricallyconnected to the common electrode 105D. Any common electrode iselectrically connected to at least one of the redundant lines. Theredundant line has a resistivity smaller than that of the commonelectrode. For example, in FIG. 2, the common electrode 105D may besimultaneously electrically connected to three redundant lines 108 via,the via holes, respectively. In this embodiment, three redundant lines108 are illustrated by way of example. It should be noted that thenumber of redundant lines 108 is not limited to three, but may bearbitrarily designed according to the requirements of the productwithout limitation. In addition, the redundant lines 108 have aresistivity smaller than that of the common electrode. The redundantlines 108 as Tell as the first conversion lines 107 and the secondconversion lines 109 are obtained by patterning the conversion layer (itcan also be understand that the redundant lines 108 as well as the firstconversion lines 107 and the second conversion lines 109 aremanufactured by the same material and by the same manufactureprocedure), and typically, the first conversion lines 107 and the secondconversion lines 109 are formed of low resistivity material such asmetal. Each independent common electrode is connected to a plurality ofredundant lines, respectively, thereby further lowering a resistance ofthe common electrode and improving touch control characteristics of thecommon electrode.

It should be further noted that, in the partial enlarged viewillustrated in FIG. 2, three first conversion lines 107 that areelectrically connected to the gate line 103C are exemplarily depicted onthe gate line 103C. However, this is not intended to be limiting. Withrespect to each of the other gate lines, such as gate lines 103A, 103Band 103D, there may be any number of first conversion lines 107 that areelectrically connected thereto. Even though those lines are not depictedin FIG. 2 for clarity, this is not intended to be limiting. Likewise,only three second conversion lines 109 that are electrically connectedto the common electrode 105A are exemplarily depicted on the commonelectrode 105A. With respect to each of the other common electrodes105B, 105C and 105D, there may be any number of second conversion lines109 that are electrically connected thereto. Even though those lines arenot depicted in FIG. 2 for clarity, this is not intended to be limiting.Likewise, only three redundant lines 108 that are electrically connectedto the common electrode 105D are exemplarily depicted on the commonelectrode 105D. With respect to each of the other common electrodes105A, 105B and 105C, there may be any number of redundant lines 108 thatare electrically connected thereto. Even though those lines are notdepicted in FIG. 2 for clarity, this is not intended to be limiting.

FIG. 3 is a partial sectional view of a touch control display deviceprovided in an embodiment of the present disclosure. In one embodiment,FIG. 3 provides a structural sectional view of two adjacent sub pixels,including: a base substrate 11; a semiconductor layer 13 provided on thebase substrate 11, and the semiconductor layer 13 includes a sourceregion and a drain region; an interlayer insulation layer 12 provided onthe semiconductor layer; a gate metal layer provided on the interlayerinsulation layer 12, and the gate metal layer includes a gate electrode104 and a plurality of gate lines 103; a first insulation layer 15provided on the gate metal layer; a source/drain electrode metal layerprovided on the first insulation layer 15, and the source/drainelectrode metal layer includes a source electrode 17, a drain electrode19 and a plurality of source lines (not illustrated in FIG. 3); a secondinsulation layer 21 provided on the source/drain electrode metal layer,and the second insulation layer 21 covers the source electrode 17 andthe drain electrode 19; a common electrode layer provided on the secondinsulation layer 21, and the common electrode layer includes a pluralityof common electrodes 105 that are independent from one another; a thirdinsulation layer 23 provided on the common electrodes 105 and the secondinsulation layer 21; a conversion layer provided on the third insulationlayer 23, and the conversion layer includes a first conversion line 107and a second conversion line 109; and a first via hole 1031 and a secondvia hole 1052, and the first via hole 1031 penetrates the firstinsulation layer 15, the second insulation layer 21 and the thirdinsulation layer 23, and the second via hole 1052 penetrates the thirdinsulation layer 23, and and the first conversion line 107 iselectrically connected to the gate line 103 via the first via hole 1031,and the second conversion line 109 is electrically connected to thecommon electrode 105 via the second via hole 1052.

In one embodiment, the sectional structure of the touch control displaydevice illustrated in FIG. 3 further includes: a pixel electrode layerprovided on the third insulation layer 23, and the pixel electrode layerincludes a plurality of pixel electrodes 25; and a third via hole 1033provided on the source electrode 17 or the drain electrode 19, and thethird via hole 1033 penetrates the second insulation layer 21 and thethird insulation layer 23 and exposes at least a portion of the sourceelectrode 17 or the drain electrode 19, and and the pixel electrode 25is electrically connected to the source electrode 17 or the drainelectrode 19 via the third via hole 1033. With such a design, the shiftregister device 111 supplies gate driving signal to the plurality ofgate lines 103 via a plurality of first conversion lines 107, and thedisplay touch control driving device 113 supplies touch control drivingsignal to the plurality of common electrodes 105 via the plurality ofsecond conversion lines 109 and/or senses touch control detection signalon the common electrodes 105 via the plurality of second conversionlines 109. Since both the first conversion line 107 and the secondconversion line 109 are provided in the display area 101 instead ofbeing provided in the bezels area at the left and right sides of thedisplay area 101, a narrow bezel may be obtained while ensuring thedisplay and touch control function.

FIG. 4 illustrates a sectional view of another touch control displaydevice provided in an embodiment of the present disclosure. In oneembodiment, FIG. 4 provides a structural sectional view of two adjacentsub pixels, including: a base substrate 11; a semiconductor layer 13provided on the base substrate 11, and the semiconductor layer 13includes a source region and a drain region; an interlayer insulationlayer 12 provided on the semiconductor layer; a gate metal layerprovided on the interlayer insulation layer 12, and the gate metal layerincludes a gate electrode 104 and a plurality of gate lines 103; a firstinsulation layer 15 provided on the gate metal layer; a source/drainelectrode metal layer provided on the first insulation layer 15, and thesource/drain electrode metal layer includes a source electrode 17, adrain electrode 19 and a plurality of source lines (not illustrated inFIG. 4); a second insulation layer 21 provided on the source/drainelectrode metal layer, and the second insulation layer 21 covers thesource electrode 17 and the drain electrode 19; a common electrode layerprovided on the second insulation layer 21, and the common electrodelayer includes a plurality of common electrodes 105 that are independentfrom one another; a third insulation layer 23 provided on the commonelectrodes 105 and the second insulation layer 21; a conversion layerprovided on the third insulation layer 23, and the conversion layerincludes a first conversion line 107 and a second conversion line 109;and a first via hole 1031 and a second via hole 1052, and the first viahole 1031 penetrates the first insulation layer 15, the secondinsulation layer 21 and the third insulation layer 23, and the secondvia hole 1052 penetrates the third insulation layer, and and the firstconversion line 107 is electrically connected to the gate line 103 viathe first via hole 1031, and the second conversion line 109 iselectrically connected to the common electrode 105 via the second viahole 1052. It further includes: a protection layer 27 provided on thethird insulation layer 23 and the plurality of conversion lines (thefirst conversion line 107 and the second conversion line 109), and theprotection layer 27 is formed of an insulation material, and theprotection layer 27 covers the plurality of conversion lines (the firstconversion line 107 and the second conversion line 109); and a pixelelectrode 25, provided on the protection layer 27. It differs from thetouch control display device provided in FIG. 3 further in that: in thetouch control display device provided in FIG. 4, the third via hole 1033penetrates the second insulation layer 21, the third insulation layer 23and the protection layer 27, and exposes at least a portion of thesource electrode 17 or the drain electrode 19, and and the pixelelectrode 25 is electrically connected to the source electrode 17 or thedrain electrode 19 via the third via hole 1033. With such a design, byreferring to FIG. 1, the shift register device 111 supplies gate drivingsignal to the plurality of gate lines 103 via a plurality of firstconversion lines 107, and the display touch control driving device 113supplies touch control driving signal to the plurality of commonelectrodes 105 via the plurality of second conversion lines 109 and/orsenses touch control detection signal on the common electrodes 105 viathe plurality of second conversion lines 109. Since both the firstconversion line 107 and the second conversion line 109 are provided inthe display area 101 instead of being provided in the bezels area at theleft and right sides of the display area 101, a narrow bezel may beobtained while ensuring the display and touch control function. Inaddition, in the touch control display device provided in FIG. 4, theprotection layer 27 is provided on the plurality of conversion lines(the first conversion line 107 and the second conversion line 109),thereby facilitating the protection of the plurality of conversion lines(the first conversion line 107 and the second conversion line 109) frombeing exposed to the surface of the touch control display device.

FIG. 5 illustrates a sectional view of another touch control displaydevice provided in an embodiment of the present disclosure. In oneembodiment, FIG. 5 provides a structural sectional view of two adjacentsub pixels, including: a base substrate 11; a semiconductor layer 13provided on the base substrate 11, and the semiconductor layer 13includes a source region and a drain region; a gate metal layer providedon the semiconductor layer 13, and the gate metal layer includes a gateelectrode 104 and a plurality of gate lines 103; a first insulationlayer 15 provided on the gate metal layer; a source/drain electrodemetal layer provided on the first insulation layer 15, and thesource/drain electrode metal layer includes a source electrode 17, adrain electrode 19 and a plurality of source lines (not illustrated inFIG. 5); a second insulation layer 21 provided on the source/drainelectrode metal layer, and the second insulation layer 21 covers thesource electrode 17 and the drain electrode 19; a conversion layerprovided on the second insulation layer 21, and the conversion layerincludes a plurality of conversion lines (the first conversion line 107and the second conversion line 109); a third insulation layer 23provided on the plurality of conversion lines (the first conversion line107 and the second conversion line 109), and the third insulation layer23 covers the plurality of conversion lines (the first conversion line107 and the second conversion line 109) and the second insulation layer21; a common electrode layer provided on the third insulation layer 23,and the common electrode layer includes a plurality of common electrodes105 that are independent from one another; and a first via hole 1031 anda second via hole 1052, and the first via hole 1031 penetrates the firstinsulation layer 15 and the second insulation layer 21 and exposes atleast a portion of the gate line 103, and the second via hole 1052penetrates the third insulation layer 23, and and a plurality of firstconversion lines 107 are electrically connected to the plurality of gatelines 103 via the first via hole 1031, and a plurality of secondconversion lines 109 are electrically connected to the plurality ofcommon electrodes 105 via the second via hole 1052. In comparison withthe touch control display device provided in FIG. 4, the touch controldisplay device design provided in FIG. 5 may not require an additionalprotection layer covering the plurality of conversion lines (the firstconversion line 107 and the second conversion line 109), therebyreducing the manufacturing process cost.

In one embodiment, the touch control display device illustrated in FIG.5 further includes: a pixel electrode 25, interposed between theconversion line (the first conversion line 107 and the second conversionline 109) and the third insulation layer 23; and a third via hole 1033provided on the source electrode 17 or the drain electrode 19, and thethird via hole 1033 penetrates the second insulation layer 21 andexposes at least a portion of the source electrode 17 or the drainelectrode 19, and and the pixel electrode 25 is electrically connectedto the source electrode 17 or the drain electrode 19 via the third viahole 1033.

It should be noted that, with respect to the touch control displaydevice provided above in FIGS. 3, 4 and 5, the second conversion line109 and the common electrode 105 are electrically connected via thesecond via hole 1052 penetrating the third insulation layer 23. However,the electrical connection means of the second conversion line 109 andthe common electrode 105 is not limited thereto; and in certainembodiments, a film layer structure of the touch control display devicemay be provided as illustrated in the embodiment shown in FIG. 6. Thatis, the second conversion line 109 and the common electrode 105 may notdirectly contacted and electrically connected via a via hole; andinstead, they may be electrically connected via an intermediatedielectric, such as electrically connected by the intermediatedielectric 26 in the same layer with the pixel electrode 25 shown inFIG. 6. As shown in FIG. 6, the second conversion line 109 may beelectrically connected to the intermediate dielectric 26 via a fourthvia hole 1091 penetrating the protection layer 27, and the intermediatedielectric is electrically connected to the common electrode 105 via afifth via hole 1092 penetrating the protection layer 27 and the thirdinsulation layer 23, thereby electrically connecting the secondconversion line 109 with the common electrode 105.

Nevertheless, the touch control display device provided in theembodiment illustrated in FIG. 6 is only an example of the electricalconnection between the second conversion line 109 and the commonelectrode 105. It should be understood neither the technical solutionillustrated in FIG. 6 nor the shapes depicted in FIG. 6 are intended tobe limiting. In certain embodiments, other film layers may be used asthe intermediate dielectric for the electrical connection between thesecond conversion line 109 and the common electrode 105, which are notillustrated in FIG. 6 for clarity.

It should be noted that, all the thin film transistors in the touchcontrol display devices provided in FIGS. 3, 4, 5 and 6 may have a topgate structure. However, the present disclosure is not limited to thetop gate structure, and a bottom gate structure or other structures maybe applied. In the present specification, the top gate structure isprovided by way of example without limitation.

It should be further noted that, in the touch control display devicesprovided in FIGS. 3, 4, 5 and 6 above, the electrical connection means(contact means) between the first conversion line 107 and the gate line103 completely utilizes the patterned conversion layer (i.e., the firstconversion line 107 and the second conversion line 109 are the samelayer material) via the first via hole 1031, but that is not intended tobe limiting. For example, the electrical connection means (contactmeans) between the first conversion line 107 and the gate line 103 mayutilize the patterned conversion layer and the patterned source/drainelectrode layer respectively filling the first via hole 1031,respectively. Similarly, the electrical connection means between thepixel electrode 25 and the source electrode 17 or drain electrode 19 isnot limited to those illustrated above in FIGS. 3, 4, 5 and 6. Aelectrical connection means in which a multilayer conduction layer isused to fill the third via hole 1033 respectively may be utilized, whichis omitted herein.

FIGS. 7A to 7I illustrate a manufacturing method of a touch controldisplay device provided in an embodiment of the present disclosure,taking two adjacent sub pixels as an example, the method includes thefollowing steps.

As illustrated in FIG. 7A, a base substrate 11 is provided.

As illustrated in FIG. 7B, a semiconductor layer 13 is formed on thebase substrate 11, and the semiconductor layer 13 includes a sourceregion and a drain region.

As illustrated in FIG. 7C, an interlayer insulation layer 12 is formedon the semiconductor layer 13, and a gate metal layer is formed on theinterlayer insulation layer, and the gate metal layer is patterned tofrom a gate electrode 104 and a gate line 103 on the interlayerinsulation layer 12.

As illustrated in FIG. 7D, a first insulation layer 15 is formed on thegate electrode 104 and the gate line 103, and the first insulation layercovers the gate electrode 104 and the gate line 103.

As illustrated in FIG. 7E, the interlayer insulation layer and the firstinsulation layer 15 are patterned to form a drain via hole 131 exposingthe drain region and a source via hole 132 exposing the source region onthe drain region and source region of the semiconductor layer,respectively.

As illustrated in FIG. 7F, a source/drain electrode metal layer isformed on the first insulation layer, and the source/drain electrodemetal layer is patterned to form a source electrode 17, a drainelectrode 19 and a source line (not illustrated in the drawing), and thesource electrode 17 is in contact with the source region via the sourcevia hole 132, and the drain electrode 19 is in contact with the drainregion via the drain via hole 131.

As illustrated in FIG. 7G, a second insulation layer 21 is formed on thesource electrode 17, the drain electrode 19 and the source line (notillustrated in the drawing), and the second insulation layer 21 coversthe source electrode 17, the drain electrode 19 and the source line (notillustrated in the drawing).

As illustrated in FIG. 7H, a common electrode layer is formed on thesecond insulation layer 21, and the common electrode layer is patternedto form a plurality of common electrodes 105 that are independent fromone another, and the common electrode layer is generally formed oftransparent metal material such as ITO (Indium Tin Oxide) and the like.

As illustrated in FIG. 7I, a third insulation layer 23 is formed on thesecond insulation layer 21 and the common electrode 105. The firstinsulation layer 15, the second insulation layer 21 and the thirdinsulation layer 23 are patterned to form a first via hole 1031 exposingat least a portion of the gate line 103 on the gate line 103. The thirdinsulation layer 23 is patterned to form on the common electrode 105 asecond via hole 1052 that exposes at least a portion of the commonelectrode 105. The second insulation layer 21 and third insulation layer23 are patterned to form on the drain electrode 19 a third via hole 1033that exposes at least a portion of the drain electrode 19. A pixelelectrode layer and a conversion layer are formed on the thirdinsulation layer 23, and the pixel electrode layer and the conversionlayer are patterned to form a pixel electrode 25, a first conversionline 107 and a second conversion line 109 on the third insulation layer23, and the first conversion line 107 is electrically connected to thegate line 103 via the first via hole 1031, the second conversion line109 is electrically connected to the common electrode 105 via the secondvia hole, and the pixel electrode 25 is electrically connected to thedrain electrode 19 via the third via hole 1033.

In the manufacturing method of the touch control display device providedin FIGS. 7A to 7I, with reference to FIG. 1, the shift register device111 supplies gate driving signal to the plurality of gate lines 103 viathe plurality of first conversion lines 107, and the display touchcontrol driving device 113 supplies touch control driving signal to theplurality of common electrodes 105 via the plurality of secondconversion lines 109 and/or senses touch control detection signal on thecommon electrodes 105 via the plurality of second conversion lines 109.Since both the first conversion line 107 and the second conversion line109 are provided in the display area 101 instead of being provided inthe bezels area at the left and right sides of the display area 101, anarrow bezel may be obtained while ensuring the display and touchcontrol function.

It should be noted that, in the manufacturing method of the touchcontrol display device provided in FIGS. 7A to 7I, as illustrated inFIG. 7H, after forming the common electrode layer on the secondinsulation layer 21 and patterning the common electrode layer to formthe plurality of common electrodes 105 that are independent from oneanother, the steps illustrated in FIGS. 8A and 8B may be performed.

In one embodiment, as illustrated in FIG. 8A, a third insulation layer23 is formed on the second insulation layer 21 and the common electrode105. The first insulation layer 15, the second insulation layer 21 andthe third insulation layer 23 are patterned to form on the gate line 103a first via hole 1031 that exposes at least a portion of the gate line103. The third insulation layer 23 is patterned to form on the commonelectrode 105 a second via hole 1052 that exposes at least a portion ofthe common electrode 105. A conversion layer is formed on the thirdinsulation layer 23, and the conversion layer is patterned to form afirst conversion line 107 and a second conversion line 109 on the thirdinsulation layer 23, and the first conversion line 107 is electricallyconnected to the gate line 103 via the first via hole 1031, and thesecond conversion line 109 is electrically connected to the commonelectrode 105 via the second via hole. A protection layer 27 is formedon the third insulation layer 23, the first conversion line 107 and thesecond conversion line 109, and the protection layer 27 covers the firstconversion line 107 and the second conversion line 109.

As illustrated in FIG. 8B, the protection layer 27, the third insulationlayer 23 and the second insulation layer 21 are patterned to form on thedrain electrode 19 a third via hole 1033 that exposes at least a portionof the drain electrode 19. A pixel electrode layer is formed on theprotection layer 27, and the pixel electrode layer is patterned to forma pixel electrode 25 that is electrically connected to the drainelectrode 19 via the third via hole 1033. In one embodiment, theprotection layer 27 is formed of an insulation material such as siliconnitride and the like. The protection layer 27 is provided on the firstconversion line 107 and the second conversion line 109, therebyfacilitating the protection of the first conversion line 107 and thesecond conversion line 109 from being exposed to the surface of thetouch control display device.

FIGS. 9A to 9J illustrate a manufacturing method of a touch controldisplay device provided in an embodiment of the present disclosure,taking two adjacent sub pixels as an example, the method includes thefollowing steps.

As illustrated in FIG. 9A, a base substrate 11 is provided.

As illustrated in FIG. 9B, a semiconductor layer 13 is formed on thebase substrate 11, and the semiconductor layer 13 includes a sourceregion and a drain region.

As illustrated in FIG. 9C, an interlayer insulation layer 12 is formedon the semiconductor layer 13, and a gate metal layer is formed on theinterlayer insulation layer, and the gate metal layer is patterned toform a gate electrode 104 and a gate line 103 on the interlayerinsulation layer 12.

As illustrated in FIG. 9D, a first insulation layer 15 is formed on thegate electrode 104 and the gate line 103, and the first insulation layercovers the gate electrode 104 and the gate line 103.

As illustrated in FIG. 9E, the interlayer insulation layer and the firstinsulation layer 15 are patterned to form a drain via hole 131 exposingthe drain region and a source via hole 132 exposing the source region onthe drain region and source region of the semiconductor layer,respectively.

As illustrated in FIG. 9F, a source/drain electrode metal layer isformed on the first insulation layer, and the source/drain electrodemetal layer is patterned to form a source electrode 17, a drainelectrode 19 and a source line (not illustrated in the drawing), and thesource electrode 17 is in contact with the source region via the sourcevia hole 132, and the drain electrode 19 is in contact with the drainregion via the drain via hole 131.

As illustrated in FIG. 9G, a second insulation layer 21 is formed on thesource electrode 17, the drain electrode 19 and the source line (notillustrated in the drawing), and the second insulation layer 21 coversthe source electrode 17, the drain electrode 19 and the source line (notillustrated in the drawing).

As illustrated in FIG. 9H, the first insulation layer 15 and the secondinsulation layer 21 are patterned to form on the gate line 103 a firstvia hole 1031 that exposes at least a portion of the gate line 103. Thesecond insulation layer 21 is patterned to form on the drain electrode19 a third via hole 1033 that exposes at least a portion of the drainelectrode 19. A pixel electrode layer and a conversion layer are formedon the second insulation layer 21, and the pixel electrode layer and theconversion layer are patterned to form on the second insulation layer 21a pixel electrode 25, a first conversion line 107 electrically connectedto the gate line 103 via the first via hole 1031 and a second conversionline 109 electrically connected to the drain electrode 19 via the thirdvia hole.

As illustrated in FIG. 9I, a third insulation layer 23 is formed on thepixel electrode 25, the first conversion line 107 and the secondconversion line 109.

As illustrated in FIG. 9J, the third insulation layer 23 is patterned toform a second via hole 1052 on the second conversion line 109. A commonelectrode layer is formed on the third insulation layer 23, and thecommon electrode layer is patterned to form on the third insulation theplurality of layer common electrodes 105 that are independent from oneanother and are electrically connected to the second conversion line 109via the second via hole 1052.

In the manufacturing method of the touch control display device providedin FIGS. 9A to 9I, with reference to FIG. 1, the shift register device111 supplies gate driving signal to the plurality of gate lines 103 viathe plurality of first conversion lines 107, and the display touchcontrol driving device 113 supplies touch control driving signal to theplurality of common electrodes 105 via the plurality of secondconversion lines 109 and/or senses touch control detection signal on thecommon electrodes 105 via the plurality of second conversion lines 109.Since both the first conversion line 107 and the second conversion line109 are provided in the display area 101 instead of being provided inthe bezels area at the left and right sides of the display area 101, anarrow bezel may be obtained while ensuring the display and touchcontrol function.

It should be noted that, in the manufacturing method of the touchcontrol display device provided in FIGS. 7A to 7I, since the first viahole 1031 penetrates the first insulation layer 15, the secondinsulation layer 21 and the third insulation layer 23, the first viahole 1031 is formed on the gate line 103 using a technical solution inwhich the first insulation layer 15, the second insulation layer 21 andthe third insulation layer 23 are patterned together. However, thepresent disclosure is not limited thereto. In certain embodiments, thefirst insulation layer 15 may be first patterned, then the secondinsulation layer 21 may be patterned, and after that, the thirdinsulation layer 23 may be patterned, thereby forming the first via hole1031. Similarly, such a technical solution is also applicable forforming the second via hole 1052 and the third via hole 1033. That is,the technical solutions for forming the first via hole 1031, the secondvia hole 1052 and the third via hole 1033 provided in FIGS. 8A to 8B andFIGS. 9A to 9J are not limited thereto, as long as it is ensured that:the first via hole 1031 is formed on the gate line 103 and exposes atleast a portion of the gate line 103, and the first conversion line 107is electrically connected to the gate line 103 via the first via hole1031; the second via hole 1052 is formed on the common electrode 105 andexposes at least a portion of the common electrode 105, and the secondconversion line 109 is electrically connected to the common electrode105 via the second via hole 1052; and the third via hole 1033 is formedon the drain electrode 19 and exposes at least a portion of the drainelectrode 19, and the pixel electrode 25 is electrically connected tothe drain electrode 19 via the third via hole 1033.

The touch control display device and the manufacturing method thereofprovided in the embodiments of the present disclosure have beendescribed in detail above. In the context, examples are provided todescribe the principle and implementation of the present disclosure,which are provided for a better understanding of the method and coreconcept of the present disclosure. Accordingly, the presentspecification should not be interpreted as limitation of the presentdisclosure.

What is claimed is:
 1. A method for manufacturing a touch controldisplay device, comprising: providing a base substrate; forming, on thebase substrate, a thin film transistor element layer comprising a gatemetal layer and a source/drain electrode metal layer, wherein the gatemetal layer comprises a gate electrode and a plurality of gate lines,and the source/drain electrode metal layer comprises a source electrode,a drain electrode and a plurality of source lines; forming a commonelectrode layer on the thin film transistor element layer, andpatterning the common electrode layer to form a plurality of commonelectrodes that are independent from one another; forming a thirdinsulation layer on the common electrode and the thin film transistorelement layer; forming a conversion layer on the third insulation layer,and patterning the conversion layer to form a plurality of conversionlines comprising a plurality of first conversion lines and a pluralityof second conversion lines; and forming on the gate line a first viahole that exposes at least a portion of the gate line, and forming onthe common electrode a second via hole that exposes at least a portionof the common electrode, wherein the plurality of first conversion linesare electrically connected to the plurality of gate lines via the firstvia hole, and the plurality of second conversion lines are electricallyconnected to the plurality of common electrodes via the second via,hole.
 2. The manufacturing method according to claim 1, wherein themethod further comprises: after forming a conversion layer on the thirdinsulation layer, and patterning the conversion layer to form aplurality of conversion lines,forming a protection layer on the thirdinsulation layer and the plurality of conversion lines, wherein theprotection layer covers the plurality of conversion lines.
 3. Themanufacturing method according to claim 1, wherein the thin filmtransistor element layer further comprises a first insulation layercovering the gate electrode and the plurality of gate lines and a secondinsulation layer covering the source electrode, the drain electrode andthe plurality of source lines, and the step of forming on the gate linea first via hole comprises: patterning the first insulating layer, thesecond insulating layer and the third insulating layer to form the firstvia hole on the gate line, wherein the first via hole penetrates thefirst insulating layer, the second insulating layer and the thirdinsulating layer and exposes at least a portion of the gate line.
 4. Amethod for manufacturing a touch control display device, comprising:providing a base substrate; forming, on the base substrate, a thin filmtransistor element layer comprising a gate metal layer and asource/drain electrode metal layer, wherein the gate metal layercomprises a gate electrode and a plurality of gate lines, and thesource/drain electrode metal layer comprises a source electrode, a drainelectrode and a plurality of source lines; patterning the thin filmtransistor element layer to form on the gate line a first via hole thatexposes at least a portion of the gate line; forming a pixel electrodelayer and a conversion layer on the thin film transistor element layer;patterning the conversion layer and the pixel electrode layer to form apixel electrode, a plurality of first conversion lines and a pluralityof second conversion lines, wherein the plurality of first conversionlines are electrically connected to the plurality of gate lines via thefirst via hole; forming a third insulation layer on the first conversionline, the second conversion line and the pixel electrode; patterning thethird insulation layer to form on the second conversion line a secondvia hole that exposes at least a portion of the second conversion line;and forming a common electrode layer on the third insulation layer andpatterning the common electrode layer to form a plurality of commonelectrodes that are independent from one another, wherein the commonelectrode is electrically connected to the second conversion line viathe second via hole.
 5. The manufacturing method according to claim 4,wherein the thin film transistor element layer further comprises a firstinsulation layer covering the gate electrode and the plurality of gatelines and a second insulation layer covering the source electrode, thedrain electrode and the plurality of source lines, and the step ofpatterning the thin film transistor element layer to form on the gateline a first via hole comprises: patterning the first insulating layerand the second insulating layer to form the first via hole on the gateline, wherein the first via hole penetrates the first insulating layerand the second insulating layer and exposes at least a portion of thegate line.